具体可分为热扩散法与动态磁控阴极电弧、超长矩形电弧靶技术,适用场合分别为1000℃及200℃-500℃
Can be divided into specific thermal diffusion and dynamic magnetic system cathodic arc,
long rectangular arc target technology,apply occasions were 1000℃ and 200℃-500℃
种类及参数一
Types and parameters one
种类及参数二
Types and parameters two